 This challenge was overcome when in a pioneering development in 1982, deep-UV excimer laser lithography was invented and demonstrated at IBM by K. Jain.With phenomenal advances made in equipment technology in the last two decades, today semiconductor electronic devices fabricated using excimer laser lithography total $400 billion in annual production.As a result, it is the semiconductor industry view that excimer laser lithography (with both ArF and KrF lasers) has been a crucial factor in the continued advance of the so-called Moore’s law (that describes the doubling of the number of transistors in the densest chips every two years – a trend that has continued into this decade, with the smallest device feature sizes reaching 10 nanometers in 2016) and 7 nm in 2018.