 Colloidal lithography is inexpensive and can be used to create surfaces with controlled heights and diameters.Nanocolliods are used as an etch mask by spreading them along the material surface, and then ion beam bombardment or film evaporation is used to etch away around the nanocolliods, creating nanocolumns and nanopits, respectively.The final surface structure can be controlled by varying the area covered by colloids and the colloid size.