 cross-linked polystyrene, in order to allow to write data indents by plastic deformation and erasing of the data again by heating.However, evaporation instead of plastic deformation was necessary for nanolithography applications to be able to create any pattern in the resist.Such local evaporation of resist induced by a heated tip could achieved for several materials like pentaerythritol tetranitrate, cross-linked polycarbonates, and Diels-Alder polymers.