 He was a key figure in making SOI CMOS technology a manufacturable reality and enabling the continued miniaturization of microelectronics.Early SOI technology had a number of problems with manufacturing, modeling, circuits, and reliability, and it was not clear that it could offer performance gains over established technologies.In the early 1990s, he demonstrated a novel technique of combining silicon epitaxial overgrowth and chemical mechanical polishing to prepare device-quality SOI material for fabricating devices and simple circuits, which led to IBM expanding its research program to include SOI substrates.