 CrBO3, β‐BaB2O4), pulsed laser deposition (e.g.β‐BaB2O4,  Eu(BO2)3), and atomic layer deposition (ALD).Growth by ALD was achieved using precursors composed of the tris(pyrazolyl)borate ligand and either ozone or water as the oxidant to deposit CaB2O4, SrB2O4, BaB2O4, Mn3(BO3)2, and CoB2O4 films.