 The technique is a "bottom-up" approach and allows great control over the separation of nanostructures within the array, as well as their individual widths.The separation is controlled by the size of the atomic terraces of the substrate, which is determined by its miscut from the principal index; and the width of the nanostructures is controlled by the oblique angle of the deposition.ATLAS has been shown to be a very versatile technique, with the growth of metallic, semi-conducting and magnetic nanowires and nanodots demonstrated using a variety of source materials and substrates.