 Ion layer gas reaction

Ion layer gas reaction (ILGAR®) is a non-vacuum, thin-film deposition technique developed and patented by the group of Professor Dr. Christian-Herbert Fischer at the Helmholtz-Zentrum Berlin for materials and energy in Berlin, Germany.It is a sequential and cyclic process that enables the deposition of semiconductor thin films, mainly for (although not restricted to) photovoltaic applications, specially chalcopyrite absorber layers and buffer layers.