 Lower energy GCIB treatments can be used to further smooth the surface, and GCIB can be used to produce an atomic level smoothness on both planar and nonplanar surfaces.Almost any gas can be used for GCIB, and there are many more uses for chemically reactive clusters such as for doping semiconductors (using B2H6 gas), cleaning and etching (using NF3 gas), and for depositing chemical layers.In industry, GCIB has been used for the manufacture of semiconductor devices, optical thin films, trimming SAW and FBAR filter devices , fixed disk memory systems and for other uses.