Thin Tantalum Films on Crystalline Silicon - A Metallic Glass
In: Physica Status Solidi: Rapid Research Letters, Jg. 5 (2011),
S. 68 - 70 ISSN: 1862-6254 Zeitschriftenaufsatz / Fach: Chemie
Thin amorphous tantalum films are prepared on Si(111) substrates
in a metallic glassy state. The amorphous monoatomic state of
the film is characterized by X-ray diffraction studies. The
glassy state leads to a negative temperature coefficient of the
resistivity (TCR) for low sample temperatures <200 K which is
attributed to incipient localization. Above 200 K a positive TCR
is observed as expected for a normal Boltzmann transport regime.
Upon heating the Si substrate to 1200 K TaSi2 is formed out of
the amorphous tantalum film and the silicon substrate. The TaSi2
layer is crystalline as evident from X-ray diffraction data.
Dieser Eintrag ist freigegeben.