Today, optical coatings made from TiO 2, SiO 2, Ta 2 O 5 etc. (and combinations of these) in most cases consist of amorphous phases of these compounds. Much research is carried out into thin amorphous films as a gas separating membrane layer. The technologically most important thin amorphous film is probably represented by a few nm thin SiO 2 layers serving as isolator above the conducting channel of a metal-oxide semiconductor field-effect transistor (MOSFET). Also, hydrogenated amorphous silicon (Si:H) is of technical significance for thin-film solar cells.