X-ray photoelectron spectroscopy (XPS) can be performed at beamlines equipped with a photoelectron analyzer. Traditional XPS is typically limited to probing the top few nanometers of a material under vacuum. However, the high intensity of synchrotron light enables XPS measurements of surfaces at near-ambient pressures of gas. Ambient pressure XPS (AP-XPS) can be used to measure chemical phenomena under simulated catalytic or liquid conditions. Using high-energy photons yields high kinetic energy photoelectrons which have a much longer inelastic mean free path than those generated on a laboratory XPS instrument. The probing depth of synchrotron XPS can therefore be lengthened to several nanometers, allowing the study of buried interfaces. This method is referred to as high-energy X-ray photoemission spectroscopy (HAXPES). Furthermore, the tunable nature of the synchrotron X-ray photon energies presents a wide range of depth sensitivity in the order of 2-50 nm. This allows for probing of samples at greater depths and for non destructive depth-profiling experiments.