The work function refers to removal of an electron to a position that is far enough from the surface (many nm) that the force between the electron and its image charge in the surface can be neglected. The electron must also be close to the surface compared to the nearest edge of a crystal facet, or to any other change in the surface structure, such as a change in the material composition, surface coating or reconstruction. The built-in electric field that results from these structures, and any other ambient electric field present in the vacuum are excluded in defining the work function.