MBE is an appropriate technique for the growth of high quality single-crystal films. In order to avoid a huge lattice mismatch and defects at the interface, the substrate and thin film are expected to have similar lattice constants. MBE has an advantage over other methods due to the fact that the synthesis is performed in high vacuum hence resulting in less contamination. Additionally, lattice defect is reduced due to the ability to influence the growth rate and the ratio of species of source materials present at the substrate interface. Furthermore, in MBE, samples can be grown layer by layer which results in flat surfaces with smooth interface for engineered heterostructures. Moreover, MBE synthesis technique benefits from the ease of moving a topological insulator sample from the growth chamber to a characterization chamber such as angle-resolved photoemission spectroscopy (ARPES) or scanning tunneling microscopy (STM) studies.