Photoelasticity can successfully be used to investigate the highly localized stress state within masonry or in proximity of a rigid line inclusion (stiffener) embedded in an elastic medium. In the former case, the problem is nonlinear due to the contacts between bricks, while in the latter case the elastic solution is singular, so that numerical methods may fail to provide correct results. These can be obtained through photoelastic techniques. Dynamic photoelasticity integrated with high-speed photography is utilized to investigate fracture behavior in materials. Another important application of the photoelasticity experiments is to study the stress field around bi-material notches. Bi-material notches exist in many engineering application like welded or adhesively bonded structures.