Autocloning fabrication technique, proposed for infrared and visible range photonic crystals by Sato et al. in 2002, uses electron-beam lithography and dry etching : lithographically formed layers of periodic grooves are stacked by regulated sputter deposition and etching, resulting in "stationary corrugations" and periodicity. Titanium dioxide / silica and tantalum pentoxide /silica devices were produced, exploiting their dispersion characteristics and suitability to sputter deposition.