However, hysteretic conductance in silicon was associated to memristive effects only in 2009. More recently, beginning in 2012, Tony Kenyon, Adnan Mehonic and their group clearly demonstrated that the resistive switching in silicon oxide thin films is due to the formation of oxygen vacancy filaments in defect-engineered silicon dioxide, having probed directly the movement of oxygen under electrical bias, and imaged the resultant conductive filaments using conductive atomic force microscopy.