Sputter deposition is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting material from a "target," that is source, which then deposits onto a "substrate," such as a silicon wafer.
This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Sputter deposition is a physical vapor deposition (PVD) method of depositing thin films by sputtering.
Sputter deposition is a physical vapor deposition (PVD) method of depositing thin films by sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer.
Sputter deposition is a physical vapor deposition (PVD) method of depositing thin films by sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer.