These materials can be characterized by Dil 's ABC parameters and also by the measurement one over the log of Q-sub-f divided by Q-sub-o, their namesake contrast. A commonly used type of these materials undergoes a Wolff rearrangement by a keto-carbene intermediate to form a ketene, which reacts with  water to form a carboxylic acid, and is then immersed in TMAH. HMDS may be applied before them as an adhesion promoter and some types require the use of an edge bead remover. LIGA usual y uses the  PMMA or SU-8 types of these materials. In industry, chemical y amplified ones are used, which don't  bleach like that commonly used type of these materials. That commonly used type forms a red dye as a byproduct, which helps eliminate standing waves, consists of a Novolac and a diazoquinone, and is the DNQ one. It is necessary to use a soft-, or p
These materials can be characterized by Dil 's ABC parameters and also by the measurement one over the log of Q-sub-f divided by Q-sub-o, their namesake contrast. A commonly used type of these materials undergoes a Wolff rearrangement by a keto-carbene intermediate to form a ketene, which reacts with  water to form a carboxylic acid, and is then immersed in TMAH. HMDS may be applied before them as an adhesion promoter and some types require the use of an edge bead remover. LIGA usual y uses the  PMMA or SU-8 types of these materials. In industry, chemical y amplified ones are used, which don't  bleach like that commonly used type of these materials. That commonly used type forms a red dye as a byproduct, which helps eliminate standing waves, consists of a Novolac and a diazoquinone, and is the DNQ one. It is necessary to use a soft-, or pre-, and hard-, or post-, bake with these materials. In general, they usual y consist of an inactive resin and a PAC or PAG, and they are removed with developer. For 10  points, identify these materials spun on top of a wafer before it undergoes lithography.
These materials can be characterized by Dil 's ABC parameters and also by the measurement one over the log of Q-sub-f divided by Q-sub-o, their namesake contrast.
photoresist