This molecule reacts with alpha,beta unsaturated carbonyl compounds to form cyclopropane compounds. A fifty percent solution of this molecule and water produces a lower <100> to <111> etch rate than KOH or EDP, but produces sharply defined corners. It is produced in acetone by the Bayer process, and from urea via the Hoffman process. Methyl ethyl ketone and hydrogen peroxide are two of the reactants used in the Atofina/PCUK process for its production, and it is produced when a hypochlorite ion o
This molecule reacts with alpha,beta unsaturated carbonyl compounds to form cyclopropane compounds. A fifty percent solution of this molecule and water produces a lower <100> to <111> etch rate than KOH or EDP, but produces sharply defined corners. It is produced in acetone by the Bayer process, and from urea via the Hoffman process. Methyl ethyl ketone and hydrogen peroxide are two of the reactants used in the Atofina/PCUK process for its production, and it is produced when a hypochlorite ion oxidizes ammonia in the Raschig process. For 10 points, name this molecule that attacks a carbonyl compound in the Wolff-Kishner reaction, a component of rocket fuel with formula N2H4.
This molecule reacts with alpha,beta unsaturated carbonyl compounds to form cyclopropane compounds.
hydrazine [accept early N2H4]