Along with EDP and TMAH, a combination of this and deionized water can be used to etch silicon anisotropically to <111> (one-one-one) planes.  It is most commonly produced by either the Raschig process or the more efficient Atofina-PCUK cycle. This compound's sulfate was suggested in the 1970s as a cancer treatment by Joseph Gold, and its most common industrial use is in rocket fuel. It is a reducing agent used in basic c
Along with EDP and TMAH, a combination of this and deionized water can be used to etch silicon anisotropically to <111> (one-one-one) planes.  It is most commonly produced by either the Raschig process or the more efficient Atofina-PCUK cycle. This compound's sulfate was suggested in the 1970s as a cancer treatment by Joseph Gold, and its most common industrial use is in rocket fuel. It is a reducing agent used in basic conditions in the first step of the Wolff-Kishner Reaction. FTP, identify this compound consisting of two amine groups with chemical formula N2H4.
Along with EDP and TMAH, a combination of this and deionized water can be used to etch silicon anisotropically to <111> (one-one-one) planes.  
hydrazine