What is Maskne?

October 21, 2020

We all have been seeing the stylish and colorful face coverings individuals are wearing to take mask wearing to the next level. After all, if we are required to wear a mask, why not make it fun. But did you know, for some, mask wearing can be a real concern.

You may have heard the term maskne a lot lately as people are wearing masks to protect themselves and others against the spread of COVID-19. Even though this isn’t a new phenomenon, especially amongst individuals in the medical field, maskne is a real condition.

The medical term for maskne is acne mechanica which is a skin condition that is brought on by the use of facial protection. The reason maskne happens is because wearing a mask can increase moisture buildup, which may cause bacteria to grow and spread. Prolonged wearing of masks can cause a breakout, rashes and exacerbation of other skin problems.

For these individuals it’s important to utilize light moisturizing products such as, Nourishing Biologicals Mask Logic, which heals and serves as a protective barrier. Moisturized skin is more resilient and better equipped to cope with the extremes of temperature and humidity that make it prone to irritation and chaffing.

While bacteria, viral particles and dust collect on the outside of the mask; water vapor, oil, nasal mucus, saliva, and sweat collects on the inside of the mask where it touches the face. Wash your masks after each use or at least daily. Use a gentle, nonirritating soap and place it in the dryer. The high heat will eliminate any viral particles remaining.

Don’t wear a mask at home, unless you have to, and apply a gentle healing moisturizer at night like Nourishing Biologicals Mask Logic. If you have visible irritation which does not resolve with a moisturizer, then apply a barrier cream such as zinc oxide. It is ideal to protect irritated raw skin that’s been warm and wet.

George Sadowski, M.D.
Chief Medical Officer of Nourishing Biologicals

Leave a comment

Comments will be approved before showing up.