The material structure described by SiO2 is Low Tridymite-like structured and crystallizes in the monoclinic C2/c space group. Si(1) is bonded to one O(2), one O(3), and two equivalent O(1) atoms to form corner-sharing SiO4 tetrahedra. There are three inequivalent O sites. In the first O site, O(1) is bonded in a bent 150 degrees geometry to two equivalent Si(1) atoms. In the second O site, O(3) is bonded in a linear geometry to two equivalent Si(1) atoms. In the third O site, O(2) is bonded in a bent 150 degrees geometry to two equivalent Si(1) atoms. is represented by the CIF file [CIF]
data_SiO2
_symmetry_space_group_name_H-M   'P 1'
_cell_length_a   5.085
_cell_length_b   6.900
_cell_length_c   6.900
_cell_angle_alpha   75.396
_cell_angle_beta   71.348
_cell_angle_gamma   71.348
_symmetry_Int_Tables_number   1
_cell_volume   214.291
_cell_formula_units_Z   4
loop_
 _symmetry_equiv_pos_site_id
 _symmetry_equiv_pos_as_xyz
  1  'x, y, z'
loop_
 _atom_site_type_symbol
 _atom_site_label
 _atom_site_symmetry_multiplicity
 _atom_site_fract_x
 _atom_site_fract_y
 _atom_site_fract_z
 _atom_site_occupancy
  Si  Si0  1  0.360  0.949  0.743  1.0
  Si  Si1  1  0.640  0.051  0.257  1.0
  Si  Si2  1  0.860  0.743  0.949  1.0
  Si  Si3  1  0.140  0.257  0.051  1.0
  O  O4  1  0.908  0.144  0.221  1.0
  O  O5  1  0.750  0.839  0.161  1.0
  O  O6  1  0.250  0.161  0.839  1.0
  O  O7  1  0.000  0.500  0.000  1.0
  O  O8  1  0.592  0.779  0.856  1.0
  O  O9  1  0.092  0.856  0.779  1.0
  O  O10  1  0.500  0.000  0.500  1.0
  O  O11  1  0.408  0.221  0.144  1.0
[/CIF]
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The material structure described by SiO2 is Low Tridymite-like structured and crystallizes in the monoclinic C2/c space group. Si(1) is bonded to one O(2), one O(3), and two equivalent O(1) atoms to form corner-sharing SiO4 tetrahedra. There are three inequivalent O sites. In the first O site, O(1) is bonded in a bent 150 degrees geometry to two equivalent Si(1) atoms. In the second O site, O(3) is bonded in a linear geometry to two equivalent Si(1) atoms. In the third O site, O(2) is bonded in a bent 150 degrees geometry to two equivalent Si(1) atoms. is represented by the CIF file [CIF]
data_SiO2
_symmetry_space_group_name_H-M   'P 1'
_cell_length_a   5.085
_cell_length_b   6.900
_cell_length_c   6.900
_cell_angle_alpha   75.396
_cell_angle_beta   71.348
_cell_angle_gamma   71.348
_symmetry_Int_Tables_number   1
_cell_volume   214.291
_cell_formula_units_Z   4
loop_
 _symmetry_equiv_pos_site_id
 _symmetry_equiv_pos_as_xyz
  1  'x, y, z'
loop_
 _atom_site_type_symbol
 _atom_site_label
 _atom_site_symmetry_multiplicity
 _atom_site_fract_x
 _atom_site_fract_y
 _atom_site_fract_z
 _atom_site_occupancy
  Si  Si0  1  0.360  0.949  0.743  1.0
  Si  Si1  1  0.640  0.051  0.257  1.0
  Si  Si2  1  0.860  0.743  0.949  1.0
  Si  Si3  1  0.140  0.257  0.051  1.0
  O  O4  1  0.908  0.144  0.221  1.0
  O  O5  1  0.750  0.839  0.161  1.0
  O  O6  1  0.250  0.161  0.839  1.0
  O  O7  1  0.000  0.500  0.000  1.0
  O  O8  1  0.592  0.779  0.856  1.0
  O  O9  1  0.092  0.856  0.779  1.0
  O  O10  1  0.500  0.000  0.500  1.0
  O  O11  1  0.408  0.221  0.144  1.0
[/CIF]
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