The material structure described by SiOCl2 is Indium-like structured and crystallizes in the triclinic P-1 space group. The structure is zero-dimensional and consists of one octachlorocyclo-tetrasiloxane molecule. There are two inequivalent Si sites. In the first Si site, Si(1) is bonded to one O(1), one O(2), one Cl(3), and one Cl(4) atom to form corner-sharing SiCl2O2 tetrahedra. In the second Si site, Si(2) is bonded to one O(1), one O(2), one Cl(1), and one Cl(2) atom to form corner-sharing SiCl2O2 tetrahedra. There are two inequivalent O sites. In the first O site, O(1) is bonded in a linear geometry to one Si(1) and one Si(2) atom. In the second O site, O(2) is bonded in a bent 150 degrees geometry to one Si(1) and one Si(2) atom. There are four inequivalent Cl sites. In the first Cl site, Cl(1) is bonded in a single-bond geometry to one Si(2) atom. In the second Cl site, Cl(2) is bonded in a single-bond geometry to one Si(2) atom. In the third Cl site, Cl(3) is bonded in a single-bond geometry to one Si(1) atom. In the fourth Cl site, Cl(4) is bonded in a single-bond geometry to one Si(1) atom. is represented by the Crystallographic Information File (CIF) [CIF]
data_SiCl2O
_symmetry_space_group_name_H-M   'P 1'
_cell_length_a   6.115
_cell_length_b   8.215
_cell_length_c   8.308
_cell_angle_alpha   77.487
_cell_angle_beta   81.049
_cell_angle_gamma   72.720
_symmetry_Int_Tables_number   1
_cell_volume   387.180
_cell_formula_units_Z   4
loop_
 _symmetry_equiv_pos_site_id
 _symmetry_equiv_pos_as_xyz
  1  'x, y, z'
loop_
 _atom_site_type_symbol
 _atom_site_label
 _atom_site_symmetry_multiplicity
 _atom_site_fract_x
 _atom_site_fract_y
 _atom_site_fract_z
 _atom_site_occupancy
  Si  Si0  1  0.108  0.685  0.109  1.0
  Si  Si1  1  0.892  0.315  0.891  1.0
  Si  Si2  1  0.979  0.675  0.753  1.0
  Si  Si3  1  0.021  0.325  0.247  1.0
  Cl  Cl4  1  0.747  0.337  0.419  1.0
  Cl  Cl5  1  0.253  0.663  0.581  1.0
  Cl  Cl6  1  0.717  0.880  0.675  1.0
  Cl  Cl7  1  0.283  0.120  0.325  1.0
  Cl  Cl8  1  0.127  0.126  0.789  1.0
  Cl  Cl9  1  0.873  0.874  0.211  1.0
  Cl  Cl10  1  0.576  0.283  0.899  1.0
  Cl  Cl11  1  0.424  0.717  0.101  1.0
  O  O12  1  0.951  0.306  0.075  1.0
  O  O13  1  0.049  0.694  0.925  1.0
  O  O14  1  0.899  0.500  0.779  1.0
  O  O15  1  0.101  0.500  0.221  1.0
[/CIF]
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The material structure described by SiOCl2 is Indium-like structured and crystallizes in the triclinic P-1 space group. The structure is zero-dimensional and consists of one octachlorocyclo-tetrasiloxane molecule. There are two inequivalent Si sites. In the first Si site, Si(1) is bonded to one O(1), one O(2), one Cl(3), and one Cl(4) atom to form corner-sharing SiCl2O2 tetrahedra. In the second Si site, Si(2) is bonded to one O(1), one O(2), one Cl(1), and one Cl(2) atom to form corner-sharing SiCl2O2 tetrahedra. There are two inequivalent O sites. In the first O site, O(1) is bonded in a linear geometry to one Si(1) and one Si(2) atom. In the second O site, O(2) is bonded in a bent 150 degrees geometry to one Si(1) and one Si(2) atom. There are four inequivalent Cl sites. In the first Cl site, Cl(1) is bonded in a single-bond geometry to one Si(2) atom. In the second Cl site, Cl(2) is bonded in a single-bond geometry to one Si(2) atom. In the third Cl site, Cl(3) is bonded in a single-bond geometry to one Si(1) atom. In the fourth Cl site, Cl(4) is bonded in a single-bond geometry to one Si(1) atom. is represented by the Crystallographic Information File (CIF) [CIF]
data_SiCl2O
_symmetry_space_group_name_H-M   'P 1'
_cell_length_a   6.115
_cell_length_b   8.215
_cell_length_c   8.308
_cell_angle_alpha   77.487
_cell_angle_beta   81.049
_cell_angle_gamma   72.720
_symmetry_Int_Tables_number   1
_cell_volume   387.180
_cell_formula_units_Z   4
loop_
 _symmetry_equiv_pos_site_id
 _symmetry_equiv_pos_as_xyz
  1  'x, y, z'
loop_
 _atom_site_type_symbol
 _atom_site_label
 _atom_site_symmetry_multiplicity
 _atom_site_fract_x
 _atom_site_fract_y
 _atom_site_fract_z
 _atom_site_occupancy
  Si  Si0  1  0.108  0.685  0.109  1.0
  Si  Si1  1  0.892  0.315  0.891  1.0
  Si  Si2  1  0.979  0.675  0.753  1.0
  Si  Si3  1  0.021  0.325  0.247  1.0
  Cl  Cl4  1  0.747  0.337  0.419  1.0
  Cl  Cl5  1  0.253  0.663  0.581  1.0
  Cl  Cl6  1  0.717  0.880  0.675  1.0
  Cl  Cl7  1  0.283  0.120  0.325  1.0
  Cl  Cl8  1  0.127  0.126  0.789  1.0
  Cl  Cl9  1  0.873  0.874  0.211  1.0
  Cl  Cl10  1  0.576  0.283  0.899  1.0
  Cl  Cl11  1  0.424  0.717  0.101  1.0
  O  O12  1  0.951  0.306  0.075  1.0
  O  O13  1  0.049  0.694  0.925  1.0
  O  O14  1  0.899  0.500  0.779  1.0
  O  O15  1  0.101  0.500  0.221  1.0
[/CIF]
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