dif	=	The average weighted fraction of fluorinated GHG input gas i destroyed or removed when fed into abatement systems by process tools in fab f (expressed as a decimal fraction).
dkif	=	The average weighted fraction of fluorinated GHG by-product gas k generated from input gas i that is destroyed or removed when fed into abatement systems by process tools in fab f (expressed as a decimal fraction).
ni,p,DREy	=	Number of tools that use gas i, that run chamber cleaning process p, and that are equipped with abatement systems for gas i that have the DRE DREy.
mi,q,DREz	=	Number of tools that use gas i, that run etch and/or wafer cleaning processes, and that are equipped with abatement systems for gas i that have the DRE DREz.
ni,p,a	=	Total number of tools that use gas i, run chamber cleaning process type p, and that are equipped with abatement systems for gas i.
mi,q,a	=	Total number of tools that use gas i, run etch and/or wafer cleaning processes, and that are equipped with abatement systems for gas i.
nk,i,p,DREy	=	Number of tools that use gas i, generate by-product k, that run chamber cleaning process p, and that are equipped with abatement systems for gas i that have the DRE DREy.
mk,i,q,DREz	=	Number of tools that use gas i, generate by-product k, that run etch and/or wafer cleaning processes, and that are equipped with abatement systems for gas i that have the DRE DREz.
nk,i,p,a	=	Total number of tools that use gas i, generate by-product k, run chamber cleaning process type p, and that are equipped with abatement systems for gas i.
mk,i,q,a	=	Total number of tools that use gas i, generate by-product k, run etch and/or wafer cleaning processes, and that are equipped with abatement systems for gas i.
γi,p	=	Default factor reflecting the ratio of uncontrolled emissions per tool of input gas i from tools running process sub-type p processes to uncontrolled emissions per tool of input gas i from process tools running process type q processes.
γk,i,p	=	Default factor reflecting the ratio of uncontrolled emissions per tool of input gas i from tools running process sub-type p processes to uncontrolled emissions per tool of input gas i from process tools running process type q processes.
DREy	=	Default or alternative certified DRE for gas i for abatement systems connected to CVD tool.
DREz	=	Default or alternative certified DRE for gas i for abatement systems connected to etching and/or wafer cleaning tool.
p	=	Chamber cleaning process sub-type.
q	=	Reference process type. There is one process type q that consists of the combination of etching and/or wafer cleaning processes.
f	=	Fab.
i	=	Fluorinated GHG input gas.
(ix) When using the stack testing method described in this paragraph (i), you must calculate the fraction each fluorinated input gas i exhausted in fab f from tools with abatement systems and the fraction of each by-product gas k exhausted from tools with abatement systems, as applicable, by following either the procedure set forth in paragraph (i)(3)(ix)(A) of this section or the procedure set forth in paragraph (i)(3)(ix)(B) of this section.
(A) Use Equation I-24C (for input gases) and Equation I-24D (for by-product gases) and Table I-18 of this subpart. If default values are not available in Table I-18 for a particular input gas, you must use a value of 10.
	ai,f=pγi,p∙ni,p,a+ mi,q,apγi,p∙ni,p + mi,q	Eq. I -24C
Where:
aif	=	Fraction of fluorinated input gas i exhausted from tools with abatement systems in fab f (expressed as a decimal fraction).
ni,p,a	=	Number of tools that use gas i, that run chamber cleaning process sub-type p, and that are equipped with abatement systems for gas i.
mi,q,a	=	Number of tools that use gas i, that run etch and/or wafer cleaning processes, and that are equipped with abatement systems for gas i.
ni,p	=	Total number of tools using gas i and running chamber cleaning process sub-type p.
mi,q	=	Total number of tools using gas i and running etch and/or wafer cleaning processes.
γi,p	=	Default factor reflecting the ratio of uncontrolled emissions per tool of input gas i from tools running process type p processes to uncontrolled emissions per tool of input gas i from process tools running process type q processes.
p	=	Chamber cleaning process sub-type.
q	=	Reference process type. There is one process type q that consists of the combination of etching and/or wafer cleaning processes.
	ak,i,f=pγk,i,p∙nk,i,p,a+ mk, i,q,apγk,i,p∙nk,i,p + mk,i,q 	Eq. I-24D
Where:
ak,i,f	=	Fraction of by-product gas k exhausted from tools using input gas i with abatement systems in fab f (expressed as a decimal fraction).
nk,i,p,a	=	Number of tools that exhaust by-product gas k from input gas i, that run chamber cleaning process p, and that are equipped with abatement systems for gas k.
mk,i,q,a	=	Number of tools that exhaust by-product gas k from input gas i, that run etch and/or wafer cleaning processes, and that are equipped with abatement systems for gas k.
nk,i,p	=	Total number of tools emitting by-product k from input gas i and running chamber cleaning process p.
mk,i,q	=	Total number of tools emitting by-product k from input gas i and running etch and/or wafer cleaning processes.
γk,i,p	=	Default factor reflecting the ratio of uncontrolled emissions per tool of by-product gas k from input gas i from tools running chamber cleaning process p to uncontrolled emissions per tool of by-product gas k from input gas i from process tools running etch and/or wafer cleaning processes.
p	=	Chamber cleaning process sub-type.
q	=	Reference process type. There is one process type q that consists of the combination of etching and/or wafer cleaning processes.
(B) Use paragraph (e) of this section to apportion consumption of gas i either to tools with abatement systems and tools without abatement systems or to each process type or sub-type, as applicable. If you apportion consumption of gas i to each process type or sub-type, calculate the fractions of input gas i and by-product gas k formed from gas i that are exhausted from tools with abatement systems based on the numbers of tools with and without abatement systems within each process type or sub-type.
(4) Method to calculate emissions from fluorinated GHGs that are not tested. Calculate emissions from consumption of each intermittent low-use fluorinated GHG as defined in § 98.98 of this subpart using the default utilization and by-product formation rates provided in Table I-11, I-12, I-13, I-14, or I-15 of this subpart, as applicable, and by using Equations I-8A, I-8B, I-9, and I-13 of this subpart. If a fluorinated GHG was not being used during the stack testing and does not meet the definition of intermittent low-use fluorinated GHG in § 98.98, then you must test the stack systems associated with the use of that fluorinated GHG at a time when that gas is in use at a magnitude that would allow you to determine an emission factor for that gas according to the procedures specified in paragraph (i)(3) of this section.
(i) [Reserved]
(ii) [Reserved]
*	*	*	*	*
 Amend § 98.94 by revising paragraphs (c) introductory text, (e), (f)(3), (f)(4) introductory text, (f)(4)(iii), (j)(1) introductory text, (j)(1)(i), (j)(3) introductory text, (j)(5)(i), and (j)(5)(ii) introductory text, and removing and reserving paragraphs (j)(6) and (j)(8)(v) to read as follows:
§ 98.94 Monitoring and QA/QC requirements.
*	*	*	*	*
(c) You must develop apportioning factors for fluorinated GHG and N2O consumption (including the fraction of gas consumed by process tools connected to abatement systems as in Equations I-8A, I-8B, I-9, and I-10 of this subpart), to use in the equations of this subpart for each input gas i, process sub-type, process type, stack system, and fab as appropriate, using a fab-specific engineering model that is documented in your site GHG Monitoring Plan as required under § 98.3(g)(5). This model must be based on a quantifiable metric, such as wafer passes or wafer starts, or direct measurement of input gas consumption as specified in paragraph (c)(3) of this section. To verify your model, you must demonstrate its precision and accuracy by adhering to the requirements in paragraphs (c)(1) and (2) of this section.
*	*	*	*	*
(e) If you use hydrocarbon-fuel-based emissions control systems to control emissions from tools that use either NF3 as an input gas in remote plasma cleaning processes or F2 as an input gas in any process, and if you use a value less than 1 for either aF2,j or aNF3,RPC in Equation I-9, you must certify and document that the model for each of the systems for which you are claiming that it does not form CF4 from F2 has been tested and verified to produce less than 0.1% CF4 from F2 and that each of the systems is installed, operated, and maintained in accordance with the directions of the emissions control system manufacturer. Hydrocarbon-fuel-based emissions control systems include but are not limited to abatement systems as defined in § 98.98 that are hydrocarbon-fuel-based. The rate of conversion from F2 to CF4 must be measured using a scientifically sound, industry-accepted method that accounts for dilution through the abatement device, such as EPA 430-R-10-003, adjusted to calculate the rate of conversion from F2 to CF4 rather than the DRE. Either the hydrocarbon-fuel-based emissions control system manufacturer or the electronics manufacturer may perform the measurement. The flow rate of F2 into the tested emissions control system(s) may be metered using a calibrated mass flow controller.
(f) *	*	*
(3) If you use default destruction and removal efficiency values in your emissions calculations under § 98.93(a), (b), and/or (i), you must certify and document that the abatement systems at your facility for which you use default destruction or removal efficiency values are specifically designed for fluorinated GHG or N2O abatement, as applicable, and that the abatement system has been tested by the abatement system manufacturer based on the methods specified in paragraph (f)(3)(i) of this section and verified to meet (or exceed) the default destruction or removal efficiency in Table I-16 for the fluorinated GHG or N2O under worst-case flow conditions as defined in paragraph (f)(3)(ii) of this section. If you use a verified destruction and removal efficiency value that is lower than the default in Table I-16 in your emissions calculations under § 98.93(a), (b), and/or (i), you must certify and document that the abatement systems at your facility for which you use the verified destruction or removal efficiency values are specifically designed for fluorinated GHG or N2O abatement, as applicable, and that the abatement system has been tested by the abatement system manufacturer based on the methods specified in paragraph (f)(3)(i) of this section and verified to meet or exceed the destruction or removal efficiency value used for that fluorinated GHG or N2O under worst-case flow conditions as defined in paragraph (f)(3)(ii) of this section. If you elect to calculate fluorinated GHG emissions using the stack test method under § 98.93(i), you must also certify that you have included and accounted for all abatement systems designed for fluorinated GHG abatement and any respective downtime in your emissions calculations under § 98.93(i)(3).
(i) For purposes of paragraph (f)(3) of this section, destruction and removal efficiencies must be measured using a scientifically sound, industry-accepted measurement methodology that accounts for dilution through the abatement system, such as EPA 430-R-10-003 (incorporated by reference, see § 98.7).
(ii) Worst-case flow conditions are defined as the highest total fluorinated GHG or N2O flows through each model of emissions control systems (gas by gas and process type by process type across the facility) and the highest total flow scenarios (with N2 dilution accounted for) across the facility during which the abatement system is claimed to be operational.
(4) If you calculate and report controlled emissions using neither the default destruction or removal efficiency values in Table I-16 of this subpart nor a manufacturer verified lower destruction or removal efficiency values per paragraph (f)(3) of this section, you must use an average of properly measured destruction or removal efficiencies for each gas and process sub-type or process type combination, as applicable, determined in accordance with procedures in paragraphs (f)(4)(i) through (vi) of this section. This includes situations in which your fab employs abatement systems not specifically designed for fluorinated GHG or N2O abatement and you elect to reflect emission reductions due to these systems. You must not use a default value from Table I-16 of this subpart for any abatement system not specifically designed for fluorinated GHG and N2O abatement, for any abatement system not certified to meet the default value from Table I-16, or for any gas and process type combination for which you have measured the destruction or removal efficiency according to the requirements of paragraphs (f)(4)(i) through (vi) of this section.
*	*	*	*	*
(iii) If you elect to take credit for abatement system destruction or removal efficiency before completing testing on 20 percent of the abatement systems for that gas and process sub-type or process type combination, as applicable, you must use default destruction or removal efficiencies or a verified destruction or removal efficiency, if verified at a lower value, for a gas and process type combination. You must not use a default value from Table I-16 of this subpart for any abatement system not specifically designed for fluorinated GHG and N2O abatement, and must not take credit for abatement system destruction or removal efficiency before completing testing on 20 percent of the abatement systems for that gas and process sub-type or process type combination, as applicable. Following testing on 20 percent of abatement systems for that gas and process sub-type or process type combination, you must calculate the average destruction or removal efficiency as the arithmetic mean of all test results for that gas and process sub-type or process type combination, until you have tested at least 30 percent of all abatement systems for each gas and process sub-type or process type combination. After testing at least 30 percent of all systems for a gas and process sub-type or process type combination, you must use the arithmetic mean of the most recent 30 percent of systems tested as the average destruction or removal efficiency. You may include results of testing conducted on or after January 1, 2011 for use in determining the site-specific destruction or removal efficiency for a given gas and process sub-type or process type combination if the testing was conducted in accordance with the requirements of paragraph (f)(4)(i) of this section.
*	*	*	*	*
(j) *	*	*
(1) Stack system testing. Conduct an emissions test for each stack system according to the procedures in paragraphs (j)(1)(i) through (iv) of this section.
(i) You must conduct an emission test during which the fab is operating at a representative operating level, as defined in § 98.98, and with the abatement systems connected to the stack system being tested operating with at least 90 percent uptime, averaged over all abatement systems, during the 8-hour (or longer) period for each stack system, or at no less than 90 percent of the abatement system uptime rate measured over the previous reporting year, averaged over all abatement systems. Hydrocarbon-fuel-based emissions control systems that are not certified not to form CF4 must operate with at least 90 percent uptime during the test.
*	*	*	*	*
(3) Fab-specific fluorinated GHG consumption measurements. You must determine the amount of each fluorinated GHG consumed by each fab during the sampling period for all process tools connected to the stack systems under § 98.93(i)(3), according to the procedures in paragraphs (j)(3)(i) and (ii) of this section.
*	*	*	*	*
(5) *	*	*
(i) Annual testing. You must conduct an annual emissions test for each stack system unless you meet the criteria in paragraph (j)(5)(ii) of this section to skip annual testing. Each set of emissions testing for a stack system must be separated by a period of at least 2 months.
(ii) Criteria to test less frequently. After the first 3 years of annual testing, you may calculate the relative standard deviation of the emission factors for each fluorinated GHG included in the test and use that analysis to determine the frequency of any future testing. As an alternative, you may conduct all three tests in less than 3 calendar years for purposes of this paragraph (j)(5)(ii), but this does not relieve you of the obligation to conduct subsequent annual testing if you do not meet the criteria to test less frequently. If the criteria specified in paragraphs (j)(5)(ii)(A) and (B) of this section are met, you may use the arithmetic average of the three emission factors for each fluorinated GHG and fluorinated GHG byproduct for the current year and the next 4 years with no further testing unless your fab operations are changed in a way that triggers the re-test criteria in paragraph (j)(8) of this section. In the fifth year following the last stack test included in the previous average, you must test each of the stack systems and repeat the relative standard deviation analysis using the results of the most recent three tests (i.e., the new test and the two previous tests conducted prior to the 4-year period). If the criteria specified in paragraphs (j)(5)(ii)(A) and (B) of this section are not met, you must use the emission factors developed from the most recent testing and continue annual testing. You may conduct more than one test in the same year, but each set of emissions testing for a stack system must be separated by a period of at least 2 months. You may repeat the relative standard deviation analysis using the most recent three tests, including those tests conducted prior to the 4-year period, to determine if you are exempt from testing for the next 4 years.
*	*	*	*	*
 Amend § 98.96 by:
a. Revising paragraphs (c)(1) and (2), (o), (p)(2), and (q)(2) and (3);
b. Revising Equation I-28 in paragraph (r)(2);
c. Revising parameters "Cif," "EFkf," "af," and "dkf" of Equation I-28 in paragraph (r)(2); and
d. Revising paragraphs (w)(2), (y) introductory text, (y)(1), (y)(2)(i) and (iv), and (y)(4).
The revisions read as follows:
§ 98.96 Data reporting requirements.
*	*	*	*	*
(c) *	*	*
(1) When you use the procedures specified in § 98.93(a) of this subpart, each fluorinated GHG emitted from each process type for which your fab is required to calculate emissions as calculated in Equations I-6, I-7, and I-9 of this subpart.
(2) When you use the procedures specified in § 98.93(a), each fluorinated GHG emitted from each process type or process sub-type as calculated in Equations I-8A and I-8B of this subpart, as applicable.
*	*	*	*	*
(o) For all hydrocarbon-fuel-based emissions control systems that are used to control emissions from tools that use either NF3 as an input gas in remote plasma clean processes or F2 as an input gas in any process type or sub-type, certification that the rate of conversion from F2 to CF4 is <0.1% and that the systems are installed, operated, and maintained in accordance with the directions of the emissions control system manufacturer, unless the emissions control system is included in the count of systems not certified to not form CF4 in Equation I-9. Hydrocarbon-fuel-based emissions control systems include but are not limited to abatement systems as defined in § 98.98 that are hydrocarbon-fuel-based. If you make the certification based on your own testing, you must certify that you tested the model of the system according to the requirements specified in § 98.94(e). If you make the certification based on testing by the emissions control system manufacturer, you must provide documentation from the emissions control system manufacturer that the rate of conversion from F2 to CF4 is <0.1% when tested according to the requirements specified in § 98.94(e).
(p) *	*	*
(2) The basis of the destruction or removal efficiency being used (default, manufacturer verified, or site specific measurement according to § 98.94(f)(4)(i)) for each process sub-type or process type and for each gas.
(q) *	*	*
(2) If you use default destruction or removal efficiency values in your emissions calculations under § 98.93(a), (b), or (i), certification that the site maintenance plan for abatement systems for which emissions are being reported contains manufacturer's recommendations and specifications for installation, operation, and maintenance for each abatement system. To use the default or lower manufacturer-verified destruction or removal efficiency values, operation of the abatement system must be within manufacturer's specifications, including but not limited to specifications on vacuum pumps' purges, fuel and oxidizer settings, supply and exhaust flows and pressures, and utilities to the emissions control equipment including fuel gas flow and pressure, calorific value, and water quality, flow and pressure.
(3) If you use default destruction or removal efficiency values in your emissions calculations under § 98.93(a), (b), and/or (i), certification that the abatement systems for which emissions are being reported were specifically designed for fluorinated GHG or N2O abatement, as applicable. You must support this certification by providing abatement system supplier documentation stating that the system was designed for fluorinated GHG or N2O abatement, as applicable, and supply the destruction or removal efficiency value at which each abatement system is certified for the fluorinated GHG or N2O abated, as applicable. You may only use the default destruction or removal efficiency value if the abatement system is verified to meet or exceed the destruction or removal efficiency default value in Table I-16. If the system is verified at a destruction or removal efficiency value lower than the default value, you may use the verified value.
*	*	*	*	*
(r) *	*	*
(2) *	*	*
      SFGHG=iEFif1-aif*dif*Cif*GWPi+kEFkf*iCif1-akif::dik*GWPk	Eq. I-28)
*	*	*	*	*
Cif	=	Total consumption of fluorinated GHG input gas i, of tools vented to stack systems, for fab f, for the reporting year, expressed in metric ton CO2e, which you used to calculate total emissions according to the procedures in § 98.93(i)(3) (expressed as a decimal fraction).
EFkf	=	Emission factor for fluorinated GHG by-product gas k, emitted from fab f, as calculated in Equation I-20 of this subpart (kg emitted/kg of all input gases consumed in tools vented to stack systems).
akif	=	Fraction of fluorinated GHG by-product gas k emitted in fab f from tools using input gas i with abatement systems (expressed as a decimal fraction), as calculated using equation I-24D.
dik	=	Fraction of fluorinated GHG byproduct k destroyed or removed in abatement systems connected to process tools in fab f, as calculated from Equation I-24B of this subpart, which you used to calculate total emissions according to the procedures in § 98.93(i)(3) (expressed as a decimal fraction).
*	*	*	*	*
(w) *	*	*
(2) An inventory of all stack systems from which process fluorinated GHG are emitted.
*	*	*	*	*
(y) If your semiconductor manufacturing facility manufactures wafers greater than 150 mm and emits more than 40,000 metric ton CO2e of GHG emissions, based on your most recently submitted annual report as required in paragraph (c) of this section, from the electronics manufacturing processes subject to reporting under this subpart, you must prepare and submit a technology assessment report every five years to the Administrator (or an authorized representative) that meets the requirements specified in paragraphs (y)(1) through (6) of this section. Any other semiconductor manufacturing facility may voluntarily submit this report to the Administrator. If your semiconductor manufacturing facility manufactures only 150 mm or smaller wafers, you are not required to prepare and submit a technology assessment report, but you are required to prepare and submit a report if your facility begins manufacturing wafers 200 mm or larger during or before the calendar year preceding the year the technology assessment report is due. If your semiconductor manufacturing facility is no longer required to report to the GHGRP under subpart I due to the cessation of semiconductor manufacturing as described in § 98.2(i)(3), you are not required to submit a technology assessment report.
(1) The first technology assessment report due after January 1, 2023 is due on March 31, 2025, and subsequent reports must be delivered every 5 years no later than March 31 of the year in which it is due.
(2) *	*	*
(i) It must describe how the gases and technologies used in semiconductor manufacturing using 200 mm and 300 mm wafers in the United States have changed in the past 5 years and whether any of the identified changes are likely to have affected the emissions characteristics of semiconductor manufacturing processes in such a way that the default utilization and by-product formation rates or default destruction or removal efficiency factors of this subpart may need to be updated.
*	*	*	*	*
(iv) It must provide any utilization and byproduct formation rates and/or destruction or removal efficiency data that have been collected in the previous 5 years that support the changes in semiconductor manufacturing processes described in the report. Any utilization or byproduct formation rate data submitted must be reported using all of the methods specified in paragraphs (y)(2)(iv)(A) through (C) of this section if multiple fluorinated input gases are used. If only one fluorinated input gas is fed into the process, you must use Equations I-29a and I-29b. The report must include the input gases used and measured, the utilization rates measured, the byproduct formation rates measured, the process type, the process subtype for chamber clean processes, the wafer size, and the methods used for the measurements. The report must also specify the method used to calculate each reported utilization and by-product formation rate, and provide a unique record number for each data set. For any destruction or removal efficiency data submitted, the report must include the input gases used and measured, the destruction and removal efficiency measured, the process type, the methods used for the measurements, and whether the abatement system is specifically designed to abate the gas measured under the operating condition used for the measurement.
(A) Dominant gas method. Use Equation I-29a to calculate the input gas emission factor (1-Uij) for each input gas in a single test. If the result of Equation I-29a exceeds 0.8 for an F-GHG, you must instead use Equation I-29c to calculate the input gas emission factor for that F-GHG and Equation I-29d to calculate the by-product formation rate for that F-GHG from the other input F-GHGs. To calculate by-product emission factors for all other measured F-GHGs, use Equation I-29b and assign all measured by-products to the dominant gas. The dominant gas is the carbon-containing input F-GHG fed into the process in the largest quantity (mass). If there are no carbon containing input F-GHGs, the dominant gas is the input F-GHG with the largest input mass.
	1-Uij=(E i)(Massi)	(Eq. I-29a)
Where:
Uij	=	Process utilization rate for fluorinated GHG i, process type j.
Ei	=	The mass emissions of input gas i.
Massi	=	The mass of input gas i fed into the process.
i	=	Fluorinated GHG input gas i.
	BEFki=(E k)Massi	(Eq. I -29b)
Where:
BEFki	=	By-product formation rate for gas k from input gas i, where gas k is not an input gas.
Ek	=	The mass emissions of by-product gas k.
Massi	=	The mass of input gas i where i is the dominant gas, as defined in (A).
i	=	Fluorinated GHG input gas i.
k	=	By-product gas k.
	1-Uij=0.8	(Eq. I-29c)
Where:
Uij	=	Process utilization rate for fluorinated GHG i, process type j.
	BEFijg=Ei-0.8*MassigMassg	(Eq. I-29d)
Where:
BEFijg	=	By-product formation rate for gas i from input gas g for process type j.
Ei	=	The mass emissions of input gas i.
Massi	=	The mass of input gas i where i is the dominant gas, as defined in (A).
Massg	=	The mass of input gas g fed into the process, where g does not equal input gas i.
i	=	Fluorinated GHG.
g	=	Fluorinated GHG input gas, where gas g is not equal to gas i.
j	=	Process type.
(B) All-input gas method. Use Equation I-30a to calculate the input gas emission factor (1-Uij) for each input gas in a single test. If the result of Equation I-30a exceeds 0.8 for an F-GHG, you must use Equation I-30c to calculate the input gas emission factor for that F-GHG and Equation I-30d to calculate the by-product formation rate for that F-GHG from the other input gases. Use Equation I-30b to calculate the by-product formation rates from each input gas for F-GHGs that are not input gases. If a test uses a cleaning or etching gas that does not contain carbon in combination with a cleaning or etching gas that does contain carbon and the process chamber is not used to etch or deposit carbon-containing films, you may elect to assign carbon containing by-products only to the carbon-containing input gases. If you choose to assign carbon containing by-products only to carbon-containing input gases, remove the input mass of the non-carbon containing gases from the sum of Massi and the sum of Massg in Equations I-30b and I-30d, respectively.
	1-Uij=(E i)(Massi)	(Eq. I-30a)
Where:
Uij	=	Process utilization rate for fluorinated GHG i, process type j.
Ei	=	The mass emissions of input gas i.
Massi	=	The mass of input gas i fed into the process.
i	=	Fluorinated GHG.
j	=	Process type.
	 	(Eq. I -30b)
Where:
BEFkji	=	By-product formation rate for gas k from input gas i, for process type j, where gas k is not an input gas.
Ek	=	The mass emissions of by-product gas k.
Massi 	=	The mass of input gas i fed into the process.
i	=	Fluorinated GHG.
j	=	Process type.
k	=	Fluorinated GHG by-product.
	1-Uij=0.8	(Eq. I-30c)
Where:
Uij	=	Process utilization rate for fluorinated GHG i, process type j.
	BEFijg=Ei-0.8*MassigMassg	(Eq. I -30d)
Where:
BEFijg	=	By-product formation rate for gas i from input gas g for process type j.
Ei	=	The mass emissions of input gas i.
Massi 	=	The mass of input gas i fed into the process.
Massg	=	The mass of input gas g fed into the process, where g does not equal input gas i.
i	=	Fluorinated GHG.
g	=	Fluorinated GHG input gas, where gas g is not equal to gas i.
j	=	Process type.
(C) Reference emission factor method. Calculate the input gas emission factors and by-product formation rates from a test using Equations I-31a and I-31b, and Table I-19 or I-20 of this subpart. In this case, use Equation I-31a to calculate the input gas emission factors and use Equation I-31b and I-30b to calculate the by-product formation rates.
		(Eq. I-31a)
Where:
Uij	=	Process utilization rate for fluorinated GHG i, process type j.
Uijr	=	Reference process utilization rate for fluorinated GHG i, process type j, for input gas i, using Table I-19 or I-20 of this subpart as appropriate.
Ei	=	The mass emissions of input gas i.
Massi	=	The mass of gas i fed into the process.
Massg	=	The mass of input gas g fed into the process, where g does not equal input gas i.
BEFijgr	=	Reference by-product formation rate for gas i from input gas g for process type j, using Table I-19.
i	=	Fluorinated GHG.
g	=	Fluorinated GHG input gas, where gas g is not equal to gas i.
r	=	Reference data.
		(Eq. I -31b)
Where:
BEFijg	=	By-product formation rate for gas i from input gas g for process type j, where gas i is also an input gas.
BEFijgr	=	By-product formation rate for gas i from input gas g for process type j from Table I-19 or I-20 of this subpart, as appropriate.
Uijr	=	Process utilization rate for fluorinated GHG i, process type j, for input gas i, using Table I-19 or I-20 of this subpart, as appropriate.
Ei	=	The mass emissions of input gas i.
Massi	=	The mass of gas i fed into the process.
Massg	=	The mass of input gas g fed into the process, where g does not equal input gas i.
i	=	Fluorinated GHG.
j	=	Process type.
g	=	Fluorinated GHG input gas, where gas g is not equal to gas i.
 r	=	Reference data.
*	*	*	*	*
(4) Multiple semiconductor manufacturing facilities may submit a single consolidated technology assessment report as long as the facility identifying information in § 98.3(c)(1) and the certification statement in § 98.3(c)(9) is provided for each facility for which the consolidated report is submitted.
*	*	*	*	*
 Amend § 98.97 by:
a. Revising paragraphs (b), (d)(1)(iii), (d)(3), (d)(5)(i), (d)(6) and (7), (d)(9)(i) and (ii);
b. Removing and reserving paragraph (i)(1); and
c. Revising paragraphs (i)(5) and (9) and (k).
The revisions read as follows:
§ 98.97 Records that must be retained.
*	*	*	*	*
(b) If you use hydrocarbon-fuel-based emissions control systems to control emissions from tools that use either NF3 as an input gas in remote plasma cleaning processes or F2 as an input gas in any process, and if you use a value less than 1 for either aF2,j or aNF3,RPC in Equation I-9, certification and documentation that the model for each of the systems that you claim does not form CF4 from F2 has been tested and verified to produce less than 0.1% CF4 from F2, and certification that the site maintenance plan includes the emission control system manufacturer's recommendations and specifications for installation, operation, and maintenance of those systems. If you are relying on your own testing to make the certification that the model produces less than 0.1% CF4 from F2, the documentation must include the model tested, the method used to perform the testing (e.g., EPA 430-R-10-003, modified to calculate the formation rate of CF4 from F2 rather than the DRE), complete documentation of the results of any initial and subsequent tests, and a final report similar to that specified in EPA 430-R-10-003, with appropriate adjustments to reflect the measurement of the formation rate of CF4 from F2 rather than the DRE. If you are relying on testing by the emissions control system manufacturer to make the to make the certification that the system produces less than 0.1% CF4 from F2, the documentation must include the model tested, the method used to perform the testing, and the results of the test.
*	*	*	*	*
(d) *	*	*
(1) *	*	*
(iii) If you use either default destruction or removal efficiency values or certified destruction or removal efficiency values that are lower than the default values in your emissions calculations under § 98.93(a), (b), and/or (i), certification that the abatement systems for which emissions are being reported were specifically designed for fluorinated GHG and N2O abatement, as required under § 98.94(f)(3), certification that the site maintenance plan includes the abatement system manufacturer's recommendations and specifications for installation, operation, and maintenance, and the certified destruction and removal efficiency values for all applicable abatement systems. For abatement systems purchased after January 1, 2023, also include records of the method used to measure the destruction and removal efficiency values.
*	*	*	*	*
(3) Where either the default destruction or removal efficiency value or a certified destruction or removal efficiency value that is lower than the default is used, documentation from the abatement system supplier describing the equipment's designed purpose and emission control capabilities for fluorinated GHG and N2O.
*	*	*	*	*
(5) *	*	*
(i) The number of abatement systems of each manufacturer, and model numbers, and the manufacturer's certified fluorinated GHG and N2O destruction or removal efficiency, if any.
*	*	*	*	*
(6) Records of all inputs and results of calculations made accounting for the uptime of abatement systems used during the reporting year, in accordance with Equations I-15 or I-23 of this subpart, as applicable. The inputs should include an indication of whether each value for destruction or removal efficiency is a default value, lower manufacturer verified value, or a measured site-specific value.
(7) Records of all inputs and results of calculations made to determine the average weighted fraction of each gas destroyed or removed in the abatement systems for each stack system using Equations I-24A and I-24B of this subpart, if applicable. The inputs should include an indication of whether each value for destruction or removal efficiency is a default value, lower manufacturer-verified value, or a measured site-specific value.
*	*	*	*	*
(9) *	*	*
(i) The site maintenance plan for abatement systems must be based on the abatement system manufacturer's recommendations and specifications for installation, operation, and maintenance if you use default or lower-manufacturer verified destruction and removal efficiency values in your emissions calculations under § 98.93(a), (b), and/or (i). If the manufacturer's recommendations and specifications for installation, operation, and maintenance are not available, you cannot use default destruction and removal efficiency values or lower manufacturer verified value in your emissions calculations under § 98.93(a), (b), and/or (i). If you use an average of properly measured destruction or removal efficiencies determined in accordance with the procedures in § 98.94(f)(4)(i) through (vi), the site maintenance plan for abatement systems must be based on the abatement system manufacturer's recommendations and specifications for installation, operation, and maintenance, where available. If you deviate from the manufacturer's recommendations and specifications, you must include documentation that demonstrates how the deviations do not negatively affect the performance or destruction or removal efficiency of the abatement systems.
(ii) The site maintenance plan for abatement systems must include a defined preventative maintenance process and checklist. Preventative maintenance must include, but is not limited to, calibration of pump purge flow indicators. Pump purge flow indicators must be calibrated each time a vacuum pump is serviced or exchanged.
*	*	*	*	*
(i) *	*	*
(5) The fab-specific emission factor and the calculations and data used to determine the fab-specific emission factor for each fluorinated GHG and by-product, as calculated using Equations I-19A, I-19B, I-19C and I-20 of § 98.93(i)(3).
*	*	*	*	*
(9) The number of tools vented to each stack system in the fab and all inputs and results for the calculations accounting for the fraction of gas exhausted through abatement systems using Equations I-24C and I-24D.
*	*	*	*	*
(k) Annual gas consumption for each fluorinated GHG and N2O as calculated in Equation I-11 of this subpart, including where your fab used less than 50 kg of a particular fluorinated GHG or N2O used at your facility for which you have not calculated emissions using Equations I-6, I-7, I-8A, I-8B, I-9, I-10, I-21, or I-22 of this subpart, the chemical name of the GHG used, the annual consumption of the gas, and a brief description of its use.
*	*	*	*	*
 Amend § 98.98 by adding in alphabetical order a definition for "Hydrocarbon-fuel based emission control systems" and revising the definition of "Operational mode" to read as follows:
§ 98.98 Definitions.
*	*	*	*	*
Hydrocarbon-fuel based emission control systems means a hydrocarbon fuel based combustion device or equipment that is designed to destroy or remove gas emissions in exhaust streams via combustion from one or more electronics manufacturing production processes, and includes both emission control systems that are and are not designed to destroy or remove fluorinated GHGs or N2O.
*	*	*	*	*
Operational mode means the time in which an abatement system is properly installed, maintained, and operated according to the site maintenance plan for abatement systems as required in § 98.94(f)(1) and defined in § 98.97(d)(9). This includes being properly operated within the range of parameters as specified in the site maintenance plan for abatement systems and within the range of parameters as specified in the DRE certification documentation. An abatement system is considered to not be in operational mode when it is not operated and maintained according to the site maintenance plan for abatement systems and within the range of parameters as specified in the DRE certification documentation.
*	*	*	*	*
 Remove Table I-1 to subpart I of part 98 and add Table I-1A and Table I-1B to subpart I of part 98 in numerical order to read as follows:
Table I-1A to Subpart I of Part 98 -- Default Emission Factors for Manufacturing Capacity-Based Threshold Applicability Determination
                                 Product type
                             Emission factors EFi

                                      CF4
                                     C2F6
                                     CHF3
                                    c-C4F8
                                     C3F8
                                      NF3
                                      SF6
                                      N2O
Semiconductors (kg/m[2])
                                                                            0.9
                                                                            1.0
                                                                           0.04
                                                                             NA
                                                                           0.05
                                                                           0.04
                                                                           0.20
                                                                             NA
LCD (g/m[2])
                                                                           0.65
                                                                             NA
                                                                         0.0024
                                                                           0.00
                                                                             NA
                                                                           1.29
                                                                           4.14
                                                                          17.06
MEMS (kg/m[2])
                                                                          0.015
                                                                             NA
                                                                             NA
                                                                          0.076
                                                                             NA
                                                                             NA
                                                                           1.86
                                                                             NA
Notes: NA denotes not applicable based on currently available information.

Table I-1B to Subpart I of Part 98 -- Default Emission Factors for Gas Consumption-Based Threshold Applicability Determination

                                 Process Gas i

                               Fluorinated GHGs
                                      N2O
                                     1-Ui
                                                                            0.8
                                                                              1
                                     BCF4
                                                                           0.15
                                                                              0
                                     BC2F6
                                                                           0.05
                                                                              0

 Revise Table I - 3 to subpart I of part 98 to read as follows:

Table I-3 to Subpart I of Part 98 -- Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for 150 mm and 200 mm Wafer Sizes
                                 Process Type/
                                   Sub-Type
                                 Process Gas i

                                      CF4
                                     C2F6
                                     CHF3
                                     CH2F2
                                     C2HF5
                                     CH3F
                                     C3F8
                                     C4F8
                                      NF3
                                      SF6
                                     C4F6
                                     C5F8
                                     C4F8O
                            ETCHING/ WAFER CLEANING
                                     1-Ui
                                     0.73
                                     0.72
                                     0.51
                                     0.13
                                     0.064
                                     0.70
                                      NA
                                     0.14
                                     0.19
                                     0.55
                                     0.083
                                     0.072
                                      NA
                                     BCF4
                                      NA
                                     0.10
                                     0.085
                                     0.079
                                     0.077
                                      NA
                                      NA
                                     0.11
                                    0.0040
                                     0.13
                                     0.095
                                      NA
                                      NA
                                     BC2F6
                                     0.041
                                      NA
                                     0.035
                                     0.025
                                     0.024
                                    0.0034
                                      NA
                                     0.037
                                     0.025
                                     0.11
                                     0.073
                                     0.014
                                      NA
                                     BC4F8
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     BC3F8
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     BCHF3
                                     0.091
                                     0.047
                                      NA
                                     0.049
                                      NA
                                      NA
                                      NA
                                     0.040
                                      NA
                                    0.0012
                                     0.066
                                    0.0039
                                      NA
                               CHAMBER CLEANING
                            In situ plasma cleaning
                                     1-Ui
                                     0.92
                                     0.55
                                      NA
                                      NA
                                      NA
                                      NA
                                     0.40
                                     0.10
                                     0.18
                                      NA
                                      NA
                                      NA
                                     0.14
                                     BCF4
                                      NA
                                     0.19
                                      NA
                                      NA
                                      NA
                                      NA
                                     0.20
                                     0.11
                                     0.14
                                      NA
                                      NA
                                      NA
                                     0.13
                                     BC2F6
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     0.045
                                     BC3F8
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                            Remote plasma cleaning
                                     1-Ui
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     0.028
                                      NA
                                      NA
                                      NA
                                      NA
                                     BCF4
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     0.015
                                      NA
                                      NA
                                      NA
                                      NA
                                     BC2F6
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     BC3F8
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      BF2
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      0.5
                                      NA
                                      NA
                                      NA
                                      NA
                           In situ thermal cleaning
                                     1-Ui
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     BCF4
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     BC2F6
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     BC3F8
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
Notes: NA = Not applicable; i.e., there are no applicable default emission factor measurements for this gas. This does not necessarily imply that a particular gas is not used in or emitted from a particular process sub-type or process type.

 Revise Table I - 4 to subpart I of part 98 to read as follows:
Table I-4 to Subpart I of Part 98 -- Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for 300 mm and 450 mm Wafer Size
                             Process Type/Sub-Type

                                 Process Gas i

                                      CF4
                                     C2F6
                                     CHF3
                                     CH2F2
                                     CH3F
                                     C3F8
                                     C4F8
                                      NF3
                                      SF6
                                     C4F6
                                     C5F8
                                     C4F8O

                            ETCHING/WAFER CLEANING
                                     1-Ui
                                     0.65
                                     0.80
                                     0.37
                                     0.20
                                     0.30
                                     0.30
                                     0.18
                                     0.16
                                     0.29
                                     0.15
                                     0.10
                                      NA
                                     BCF4
                                      NA
                                     0.21
                                     0.076
                                     0.060
                                    0.0291
                                     0.21
                                     0.045
                                     0.044
                                     0.033
                                     0.059
                                     0.11
                                      NA
                                     BC2F6
                                     0.058
                                      NA
                                     0.058
                                     0.043
                                     0.009
                                     0.18
                                     0.027
                                     0.045
                                     0.041
                                     0.062
                                     0.083
                                      NA
                                     BC4F8
                                    0.0046
                                      NA
                                    0.0027
                                     0.054
                                    0.0070
                                      NA
                                      NA
                                      NA
                                      NA
                                    0.0051
                                      NA
                                      NA
                                     BC3F8
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                    0.00012
                                      NA
                                     BCHF3
                                     0.012
                                      NA
                                      NA
                                     0.057
                                     0.016
                                     0.012
                                     0.028
                                     0.023
                                    0.0039
                                     0.017
                                    0.0069
                                      NA
                                    BCH2F2
                                     0.005
                                      NA
                                    0.0024
                                      NA
                                    0.0033
                                      NA
                                    0.0021
                                    0.00074
                                   0.000020
                                   0.000030
                                      NA
                                      NA
                                     BCH3F
                                    0.0061
                                      NA
                                     0.027
                                    0.0036
                                      NA
                                    0.00073
                                    0.0063
                                    0.0080
                                    0.0082
                                    0.00065
                                      NA
                                      NA

                               CHAMBER CLEANING

                            In situ plasma cleaning
                                     1-Ui
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     0.20
                                      NA
                                      NA
                                      NA
                                      NA
                                     BCF4
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     0.037
                                      NA
                                      NA
                                      NA
                                      NA
                                     BC2F6
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     BC3F8
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA

                            Remote plasma cleaning
                                     1-Ui
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     0.063
                                      NA
                                     0.018
                                      NA
                                      NA
                                      NA
                                      NA
                                     BCF4
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     0.037
                                      NA
                                      NA
                                      NA
                                      NA
                                     BC2F6
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     BC3F8
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     BCHF3
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                   0.000059
                                      NA
                                      NA
                                      NA
                                      NA
                                    BCH2F2
                                      NA

                                      NA

                                      NA

                                      NA

                                      NA

                                      NA

                                      NA

                                    0.00088
                                      NA

                                      NA

                                      NA

                                      NA

                                     BCH3F
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                    0.0028
                                      NA
                                      NA
                                      NA
                                      NA
                                      BF2
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      0.5
                                      NA
                                      NA
                                      NA
                                      NA

                           In situ thermal cleaning
                                     1-Ui
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     0.28
                                      NA
                                      NA
                                      NA
                                      NA
                                     BCF4
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     0.010
                                      NA
                                      NA
                                      NA
                                      NA
                                     BC2F6
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     BC3F8
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
Notes: NA = Not applicable; i.e., there are no applicable default emission factor measurements for this gas. This does not necessarily imply that a particular gas is not used in or emitted from a particular process sub-type or process type.

 Revise Table I - 8 to subpart I of part 98 to read as follows:
Table I-8 to Subpart I of Part 98 --  Default Emission Factors (1-UN2O,j) for N2O Utilization (UN2O,j)
                  Manufacturing type/process type/wafer size
                                      N2O
Semiconductor Manufacturing:
      200 mm or Less:
      CVD 1-Ui
                                                                            1.0
                       Other Manufacturing Process 1-Ui
                                                                            1.0
      300 mm or greater:
      CVD 1-Ui
                                                                            0.5
                       Other Manufacturing Process 1-Ui
                                                                            1.0
LCD Manufacturing:
                       CVD Thin Film Manufacturing 1-Ui
                                                                           0.63
All other N2O Processes
                                                                            1.0

 Revise Table I - 11 to subpart I of part 98 to read as follows:

Table I-11 to Subpart I of Part 98 -- Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for Use With the Stack Test Method (150 mm and 200 mm Wafers)
                                 All Processes

                                 Process Gas i

                                      CF4
                                     C2F6
                                     CHF3
                                     CH2F2
                                     C2HF5
                                     CH3F
                                     C3F8
                                     C4F8
                                      NF3
                                  NF3 Remote
                                      SF6
                                     C4F6
                                     C5F8
                                     C4F8O
                                     1-Ui
                                     0.79
                                     0.55
                                     0.51
                                     0.13
                                     0.064
                                     0.70
                                     0.40
                                     0.12
                                     0.18
                                     0.028
                                     0.58
                                     0.083
                                     0.072
                                     0.14
                                     BCF4
                                      NA
                                     0.19
                                     0.085
                                     0.079
                                     0.077
                                      NA
                                     0.20
                                     0.11
                                     0.11
                                     0.015
                                     0.13
                                     0.095
                                      NA
                                     0.13
                                     BC2F6
                                     0.027
                                      NA
                                     0.035
                                     0.025
                                     0.024
                                    0.0034
                                      NA
                                     0.019
                                    0.0059
                                      NA
                                     0.10
                                     0.073
                                     0.014
                                     0.045
                                     BC4F8
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     BC3F8
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     BC5F8
                                    0.00077
                                      NA
                                    0.0012
                                      NA
                                      NA
                                      NA
                                      NA
                                    0.0043
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     BCHF3
                                     0.060
                                    0.0020
                                      NA
                                     0.049
                                      NA
                                      NA
                                      NA
                                     0.020
                                      NA
                                      NA
                                    0.0011
                                     0.066
                                    0.0039
                                      NA
                                      BF2
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     0.50
                                      NA
                                      NA
                                      NA
                                      NA
Notes: NA = Not applicable; i.e., there are no applicable emission factor measurements for this gas. This does not necessarily imply that a particular gas is not used in or emitted from a particular process sub-type or process type.

 Revise Table I - 12 to subpart I of part 98 to read as follows:

Table I-12 to Subpart I of Part 98 -- Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for Use With the Stack Test Method (300 mm and 450 mm Wafers)
                                 All Processes

                                 Process Gas i

                                      CF4
                                     C2F6
                                     CHF3
                                     CH2F2
                                     CH3F
                                     C3F8
                                  C3F8 Remote
                                     C4F8
                                      NF3
                                  NF3 Remote
                                      SF6
                                     C4F6
                                     C5F8
                                     C4F8O
                                     1-Ui
                                     0.65
                                     0.80
                                     0.37
                                     0.20
                                     0.30
                                     0.30
                                     0.063
                                     0.183
                                     0.19
                                     0.018
                                     0.29
                                     0.15
                                     0.100
                                      NA
                                     BCF4
                                      NA
                                     0.21
                                     0.076
                                     0.060
                                     0.029
                                     0.21
                                      NA
                                     0.045
                                     0.040
                                     0.037
                                     0.033
                                     0.059
                                     0.109
                                      NA
                                     BC2F6
                                     0.058
                                      NA
                                     0.058
                                     0.043
                                    0.0093
                                     0.18
                                      NA
                                     0.027
                                    0.0204
                                      NA
                                     0.041
                                     0.062
                                     0.083
                                      NA
                                     BC4F6
                                    0.0083
                                      NA
                                    0.01219
                                      NA
                                     0.001
                                      NA
                                      NA
                                     0.008
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     BC4F8
                                    0.0046
                                      NA
                                    0.00272
                                     0.054
                                     0.007
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                    0.0051
                                      NA
                                      NA
                                     BC3F8
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                    0.00012
                                      NA
                                    BCH2F2
                                     0.005
                                      NA
                                    0.0024
                                      NA
                                    0.0033
                                      NA
                                      NA
                                    0.0021
                                    0.00034
                                    0.00088
                                   0.000020
                                   0.000030
                                      NA
                                      NA
                                     BCH3F
                                    0.0061
                                      NA
                                     0.027
                                    0.0036
                                      NA
                                    0.0007
                                      NA
                                    0.0063
                                    0.0036
                                    0.0028
                                    0.0082
                                    0.00065
                                      NA
                                      NA
                                     BCHF3
                                     0.012
                                      NA
                                      NA
                                     0.057
                                     0.016
                                     0.012
                                      NA
                                     0.028
                                    0.0106
                                   0.000059
                                    0.0039
                                     0.017
                                    0.0069
                                      NA
                                      BF2
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                     0.50
                                      NA
                                      NA
                                      NA
                                      NA

 Revise Table I - 16 to subpart I of part 98 to read as follows:
Table I-16 to Subpart I of Part 98 -- Default Emission Destruction or Removal Efficiency (DRE) Factors for Electronics Manufacturing
Manufacturing Type/Process Type/Gas
                             Default DRE (percent)
MEMS, LCDs, and PV Manufacturing
                                      60
Semiconductor Manufacturing

CF4
                                      87
CH3F
                                      98
CHF3
                                      97
CH2F2
                                      98
C4F8
                                      93
C4F8O
                                      93
C5F8
                                      97
C4F6
                                      95
C3F8
                                      98
C2HF5
                                      97
C2F6
                                      98
SF6
                                      95
NF3
                                      88
All other carbon-based fluorinated GHGs used in Semiconductor Manufacturing
                                      60
N2O Processes

CVD and all other N2O-using processes
                                      60

 Add Table I - 18 to subpart I of part 98 to read as follows:
Table I-18 to Subpart I of Part 98 Default factors for gamma (i,p,k,i,p, i,q, andk,i,q) for semiconductor manufacturing and for MEMS and PV manufacturing under certain conditions* for use with the stack testing method
                                 Process type
                  In-situ thermal or in-situ plasma cleaning
                            Remote plasma cleaning
                                      Gas
                                      CF4
                                     C2F6
                                    c-C4F8
                                      NF3
                                      SF6
                                     C3F8
                                      CF4
                                      NF3
If manufacturing wafer sizes <=200 mm AND manufacturing 300 mm (or greater) wafer sizes
                                     i
                                      13
                                      9.3
                                      4.7
                                      14
                                      11
                                      NA
                                      NA
                                      5.7
                                   CF4,i
                                      NA
                                      23
                                      6.6
                                      63
                                      8.5
                                      NA
                                      NA
                                      57
                                   C2F6,i
                                      NA
                                      NA
                                      NA
                                      NA
                                      3.4
                                      NA
                                      NA
                                      NA
If manufacturing <=200 mm OR manufacturing 300 mm (or greater) wafer sizes
                         i (<= 200 mm wafer size)
                                      13
                                      9.3
                                      4.7
                                      2.9
                                      11
                                      NA
                                      NA
                                      1.4
                       CF4,i (<= 200 mm wafer size)
                                      NA
                                      23
                                      6.6
                                      110
                                      8.5
                                      NA
                                      NA
                                      35
                       C2F6,i(<= 200 mm wafer size)
                                      NA
                                      NA
                                      NA
                                      NA
                                      3.4
                                      NA
                                      NA
                                      NA
                           i (300 mm wafer size)
                                      NA
                                      NA
                                      NA
                                      26
                                      NA
                                      NA
                                      NA
                                      10
                          CF4,i(300 mm wafer size)
                                      3.2
                                      NA
                                      NA
                                      17
                                      NA
                                      NA
                                      NA
                                      78
                         C2F6,i (300 mm wafer size)
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
                                      NA
* If you manufacture MEMS or PVs and use semiconductor tools and processes, you may you use the corresponding  in this table. For all other tools and processes, a default  of 10 must be used.

 Add Table I - 19 to subpart I of part 98 to read as follows:

Table I-19 to Subpart I of Part 98 Reference Emission Factors (1 - Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for 150mm and 200 mm Wafer Sizes
                             Process type/sub-type
                                 Process gas i

                                      CF4
                                     C2F6
                                     CHF3
                                     CH2F2
                                     C2HF5
                                     CH3F
                                     C3F8
                                     C4F8
                                      NF3
                                      SF6
                                     C4F6
                                     C5F8
                                     C4F8O
                            Etching/Wafer Cleaning
1-Ui
                                                                           0.73
                                                                           0.46
                                                                           0.31
                                                                           0.37
                                                                          0.064
                                                                           0.66
                                                                             NA
                                                                           0.21
                                                                           0.20
                                                                           0.55
                                                                          0.086
                                                                          0.072
                                                                             NA
BCF4
                                                                             NA
                                                                           0.20
                                                                           0.10
                                                                          0.031
                                                                          0.077
                                                                             NA
                                                                             NA
                                                                           0.17
                                                                         0.0040
                                                                          0.023
                                                                          0.089
                                                                             NA
                                                                             NA
BC2F6
                                                                          0.029
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                          0.065
                                                                             NA
                                                                             NA
                                                                          0.045
                                                                          0.014
                                                                             NA
BC4F6
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
BC4F8
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
BC3F8
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
BC5F8
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                          0.016
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
BCHF3
                                                                           0.13
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                         0.0039
                                                                             NA
                               Chamber Cleaning
                           In situ plasma cleaning:
1-Ui
                                                                           0.92
                                                                           0.55
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                           0.40
                                                                           0.10
                                                                           0.18
                                                                             NA
                                                                             NA
                                                                             NA
                                                                           0.14
BCF4
                                                                             NA
                                                                           0.19
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                           0.20
                                                                           0.11
                                                                           0.14
                                                                             NA
                                                                             NA
                                                                             NA
                                                                           0.13
BC2F6
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                          0.045
BC3F8
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                            Remote plasma cleaning:
1-Ui
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                          0.028
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
BCF4
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                          0.015
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
BC2F6
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
BC3F8
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                           In situ thermal cleaning:
1-Ui
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
BCF4
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
BC2F6
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
BC3F8
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA

 Add Table I - 20 to subpart I of part 98 to read as follows:
Table I-20 to Subpart I of Part 98 Reference Emission Factors (1 - Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for 300 mm Wafer Sizes
                             Process type/sub-type
                                 Process gas i

                                      CF4
                                     C2F6
                                     CHF3
                                     CH2F2
                                     CH3F
                                     C3F8
                                     C4F8
                                      NF3
                                      SF6
                                     C4F6
                                     C5F8
                                     C4F8O
                            Etching/Wafer Cleaning
1-Ui
                                                                           0.68
                                                                           0.80
                                                                           0.35
                                                                           0.15
                                                                           0.34
                                                                           0.30
                                                                           0.16
                                                                           0.17
                                                                           0.28
                                                                           0.17
                                                                           0.10
                                                                             NA
BCF4
                                                                             NA
                                                                           0.21
                                                                          0.073
                                                                          0.020
                                                                          0.038
                                                                           0.21
                                                                          0.045
                                                                          0.035
                                                                         0.0072
                                                                          0.034
                                                                           0.11
                                                                             NA
BC2F6
                                                                          0.041
                                                                             NA
                                                                          0.040
                                                                         0.0065
                                                                         0.0064
                                                                           0.18
                                                                          0.030
                                                                          0.038
                                                                         0.0017
                                                                          0.025
                                                                          0.083
                                                                             NA
BC4F6
                                                                         0.0015
                                                                             NA
                                                                        0.00010
                                                                             NA
                                                                         0.0010
                                                                             NA
                                                                         0.0083
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
BC4F8
                                                                         0.0051
                                                                             NA
                                                                        0.00061
                                                                             NA
                                                                         0.0070
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
BC3F8
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                        0.00012
                                                                             NA
BC5F8
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
BCHF3
                                                                         0.0056
                                                                             NA
                                                                             NA
                                                                          0.033
                                                                         0.0049
                                                                          0.012
                                                                          0.029
                                                                         0.0065
                                                                         0.0012
                                                                          0.019
                                                                         0.0069
                                                                             NA
BCH2F2
                                                                          0.014
                                                                             NA
                                                                         0.0026
                                                                             NA
                                                                         0.0023
                                                                             NA
                                                                        0. 0014
                                                                        0.00086
                                                                       0.000020
                                                                       0.000030
                                                                             NA
                                                                             NA
BCH3F
                                                                        0.00057
                                                                             NA
                                                                           0.12
                                                                             NA
                                                                             NA
                                                                        0.00073
                                                                             NA
                                                                             NA
                                                                         0.0082
                                                                             NA
                                                                             NA
                                                                             NA
                               Chamber Cleaning
                           In situ plasma cleaning:
1-Ui
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                           0.20
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
BCF4
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                          0.037
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
BC2F6
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA
                                                                             NA