We will discuss our approach towards a second generation radiation sensitive developable bottom antireflective coating (DBARC's) for 193 nm We will show imaging results (1:1 L/S features down to 140 nm) for some first generation implant resist material based upon a fluorinated resins and also show relative implant resistance of these first generation fluorinated resists towards As implantation (15 KeV at 5x10<sup>15</sup> dose with 20 x 10<sup>-4 </sup>amp)