Parallax-Tolerant Image Stitching with Epipolar Displacement Field
Jian Yu Yi Yu Feipeng Da
Large parallax image stitching is a challenging task. Existing methods often
struggle to maintain both the local and global structures of the image while
reducing alignment artifacts and warping distortions. In this paper, we propose
a novel approach that utilizes epipolar geometry to establish a warping
technique based on the epipolar displacement field. Initially, the warping rule
for pixels in the epipolar geometry is established through the infinite
homography. Subsequently, Subsequently, the epipolar displacement field, which
represents the sliding distance of the warped pixel along the epipolar line, is
formulated by thin plate splines based on the principle of local elastic
deformation. The stitching result can be generated by inversely warping the
pixels according to the epipolar displacement field. This method incorporates
the epipolar constraints in the warping rule, which ensures high-quality
alignment and maintains the projectivity of the panorama. Qualitative and
quantitative comparative experiments demonstrate the competitiveness of the
proposed method in stitching images large parallax.